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((Short description|Semiconductor manufacturing processes with a 350 nm MOSFET technology node))
((CMOS manufacturing processes))

The '''350 nanometer process''' ('''350 nm process''') is a level of semiconductor process technology that was reached in the 1995–1996 timeframe by leading semiconductor companies like [[Intel]] and [[IBM]].

==Examples==
* [[STMicroelectronics|SGS-Thomson]] 5LM<ref name=NVRIVA128D3Dpressrelease>[https://web.archive.org/web/19980613043338fw_/http://www.nvidia.com/news/pr/pr091097FR.html RIVA 128 gains support as preferred Direct3D developer platform press release], Nvidia, accessed December 3, 2023.</ref>

==Products featuring 350&nbsp;nm manufacturing process==
* [[R4200|MTI VR4300]]<nowiki/>i (1995), used in the [[Nintendo 64]] game console.
* [[Pentium (brand)|Intel Pentium]] ([[P54CS (microprocessor)|P54CS]], 1995), [[Pentium Pro]] (1995) and initial [[Pentium II]] [[CPU]]s ([[Klamath (microprocessor)|Klamath]], 1997).
* [[AMD K5]] (1996) and original [[AMD K6]] (Model 6, 1997) CPUs.
* МЦСТ-R150 (2001).
* [[Parallax Propeller]] (2006), 8 core microcontroller.<ref>((cite web |url=http://forums.parallax.com/showthread.php?130327-Propeller-I-semiconductor-process-technology-Is-it-350nm-or-180nm |archive-url=https://archive.today/20120710222806/http://forums.parallax.com/showthread.php?130327-Propeller-I-semiconductor-process-technology-Is-it-350nm-or-180nm |url-status=dead |archive-date=2012-07-10 |title=Propeller I semiconductor process technology? Is it 350nm or 180nm? |website=Parallax Forums |date= |accessdate=2015-09-13 ))</ref>
* Atmel [[ATmega328]], used in the [[Arduino UNO]].<ref>((cite journal |last1=Petryk |first1=Dmytro |last2=Dyka |first2=Zoya |title=Optical Fault Injections: a Setup Comparison |date=2018 |s2cid=198917285 ))</ref><ref>((cite book |last1=Guillen |first1=Oscar |last2=Gruber |first2=Michael |last3=De Santis |first3=Fabrizio |chapter=Low-Cost Setup for Localized Semi-invasive Optical Fault Injection Attacks: How Low Can We Go? |title=Constructive Side-Channel Analysis and Secure Design |series=Lecture Notes in Computer Science |date=2017 |volume=10348 |pages=207–222 |doi=10.1007/978-3-319-64647-3_13|isbn=978-3-319-64646-6 ))</ref>
* Nvidia [[RIVA 128]] (1997) [[GPU]]

==References==
((Reflist))

((Sequence|
prev=[[600 nanometer|600&nbsp;nm]]|
next=[[250 nanometer|250&nbsp;nm]]|
list=[[CMOS]] manufacturing processes
))

((DEFAULTSORT:350 Nanometer))
[[Category:International Technology Roadmap for Semiconductors lithography nodes|*00350]]
[[Category:1995 introductions]]

((nano-tech-stub))

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